Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions
New page: Deposition of Silicon Oxide can be done with either LPCVD, PECVD or by sputter technic. You can also make a silicon oxide layer by growing a thermal oxide in a hot furnace but that require... |
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Deposition of Silicon Oxide can be done with either LPCVD, PECVD or by sputter technic. You can also make a silicon oxide layer by growing a thermal oxide in a hot furnace but that requires a silicon substrate as a starting point. | Deposition of Silicon Oxide can be done with either LPCVD, PECVD or by sputter technic. You can also make a silicon oxide layer by growing a [[Specific Process Knowledge/Thermal Process/Oxidation|thermal oxide]] in a hot furnace but that requires a silicon substrate as a starting point. | ||
==Deposition of Silicon Oxide using LPCVD== | ==Deposition of Silicon Oxide using LPCVD== | ||