Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
| Line 63: | Line 63: | ||
==Typical beam currents== | ==Typical beam currents== | ||
Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table below. Writing time can be estimated in the software once a job is defined, it is however straight forward to estimate in advance based on area to | Beam current is a function of acceleration voltage and aperture and thus beam current is locked by the choice of acceleration voltage and aperture. Typical beam currents are given in the table below. Writing time can be estimated in the software once a job is defined, it is however straight forward to estimate in advance based on area to pattern, A, dose to clear, d0, and beam current, I as: | ||
T = d0*A/I | T = d0*A/I | ||
[[Image:CurrentAperture.png|800x800px|left|thumb|Typical beam currents as function of voltage and aperture.]] | [[Image:CurrentAperture.png|800x800px|left|thumb|Typical beam currents as function of voltage and aperture.]] | ||