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Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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Dot dose, line dose and curved element doses can be disabled in the Patterning Parameter window and in that case the system will only operate with an area dose.
Dot dose, line dose and curved element doses can be disabled in the Patterning Parameter window and in that case the system will IGNORE the type of elements that are disabled, i.e. they will not be written.




We recommend all EBL users to do a dose test prior to exposing samples of significant value. As a starting point you can consider to use the Demo.csf provided on the tool. This pattern is available in the auto generated user folder. The pattern consist of areas, curved elements, lines and dots as shown below. LINK TO PAGE WITH MORE INFO.
We recommend all EBL users to do a dose test prior to exposing samples of significant value. As a starting point you can consider to use the Demo.csf provided on the tool. This pattern is available in the auto generated user folder. The pattern consist of areas, curved elements, lines and dots as shown below.


[[Image:DoseChip6.png|500x500px|right|thumb|Overview image of the dose test design provided on the tool.]]
[[Image:DoseChip6.png|300x300px|right|thumb|Overview image of the dose test design provided on the tool.]]


Table of dose to clear on Si substrate:
Table of dose to clear on Si substrate:
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