Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

Revision as of 11:19, 17 June 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Dose information ← Older edit		Revision as of 11:20, 17 June 2022 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Dose information Newer edit →
Line 14:		Line 14:

	[[Image:Gamma_2M.jpg\|300x300px\|right\|thumb\|The SÜSS Spinner-Stepper is placed in F-3]]		[[Image:Gamma_2M.jpg\|300x300px\|right\|thumb\|The SÜSS Spinner-Stepper is placed in F-3]]
	[[Image:eLINE-Areas.png\|~~400x400px~~\|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]]		[[Image:eLINE-Areas.png\|600px\|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]]