Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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==Dose information== | ==Dose information== | ||
The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup | The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup under the "Patterning Parameter", see image below. | ||
In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell | In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell | ||
[[File:eLINE-Areas.png]] | |||
We recommend all EBL users to do a dose test prior to exposing samples of significant value. As a starting point for you can consider to use the Demo.csf provided on the tool. This pattern is available in the auto generated user folder. The pattern consist of areas, curved elements, lines and dots as shown below. LINK TO PAGE WITH MORE INFO. | |||
[[File:DoseChip6.png]] | [[File:DoseChip6.png]] | ||
Table of dose to clear on Si substrate: | Table of dose to clear on Si substrate: | ||
Revision as of 12:27, 15 June 2022
THIS PAGE IS UNDER CONSTRUCTION
Process information for the Raith eLINE Plus system
The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information.
Dose information
The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup under the "Patterning Parameter", see image below.
In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell
We recommend all EBL users to do a dose test prior to exposing samples of significant value. As a starting point for you can consider to use the Demo.csf provided on the tool. This pattern is available in the auto generated user folder. The pattern consist of areas, curved elements, lines and dots as shown below. LINK TO PAGE WITH MORE INFO.
Table of dose to clear on Si substrate:
| Dose [µC/cm2] | |||
|---|---|---|---|
| Acc. voltage | AR-P 6200.09 (180 nm) | PMMA 950k | AR-N 8200.xx |
| 10 kV | 30 | ||
| 20 kV | 70 | ||
| 30 kV | 100 | ||