Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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==Dose information==  
==Dose information==  
The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup in a master setting under the "Patterning Parameter" and hence be valid for all exposures or they can be set for each individual element of a position list.
The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup in a master setting under the "Patterning Parameter", see image below.
 
In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell




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[[File:eLINE-Areas.png]]
[[File:eLINE-Areas.png]]


[[File:eLINE-Curved.png]]
[[File:DoseChip6.png]]
 
[[File:DoseChip5.png]]
[[File:eLINE-Lines.png]]
[[File:DoseChip4.png]]
 
[[File:DoseChip3.png]]
[[File:eLINE-Dots.png]]
[[File:DoseChip2.png]]
[[File:DoseChip1.png]]


Table of dose to clear on Si substrate:
Table of dose to clear on Si substrate:

Revision as of 12:22, 15 June 2022

THIS PAGE IS UNDER CONSTRUCTION

Process information for the Raith eLINE Plus system

The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information.

Dose information

The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup in a master setting under the "Patterning Parameter", see image below.

In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell


Table of dose to clear on Si substrate:

Dose [µC/cm2]
Acc. voltage AR-P 6200.09 (180 nm) PMMA 950k AR-N 8200.xx
10 kV 30
20 kV 70
30 kV 100
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