Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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==Dose information== | ==Dose information== | ||
The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup in a master setting under the "Patterning Parameter" | The eLINE tool operates with four different dose types; area dose [µC/cm2], curved element dose [µC/cm2], line dose [pC/cm] and dot dose [pC]. Notice how the units are different for the line and dot doses. Also notice that the unit prefix changes from micro to pico. The dose for each type can be setup in a master setting under the "Patterning Parameter", see image below. | ||
In all tabs the user will set a step size, i.e. the distance between beam positions and a dose. The dwell | |||
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[[File:eLINE-Areas.png]] | [[File:eLINE-Areas.png]] | ||
[[File: | [[File:DoseChip6.png]] | ||
[[File:DoseChip5.png]] | |||
[[File: | [[File:DoseChip4.png]] | ||
[[File:DoseChip3.png]] | |||
[[File: | [[File:DoseChip2.png]] | ||
[[File:DoseChip1.png]] | |||
Table of dose to clear on Si substrate: | Table of dose to clear on Si substrate: | ||