Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 7: Line 7:


Table of dose to clear on Si substrate:
Table of dose to clear on Si substrate:
! colspan="3" style="text-align: center;" | Anneal Oxide


{| border="2" cellspacing="1" cellpadding="1" align="center"  
{| border="2" cellspacing="1" cellpadding="1" align="center"  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/eLINE"