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Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 13: Line 13:
! style="background:silver; color:black" colspan="4" | Dose [µC/cm2]
! style="background:silver; color:black" colspan="4" | Dose [µC/cm2]
|- valign="top"
|- valign="top"
! style="background:silver; color:black" | Dose [µC/cm2]
! style="background:silver; color:black" | Acc. voltage
! style="background:silver; color:black" | AR-P 6200.09 (180 nm)
! style="background:silver; color:black" | AR-P 6200.09 (180 nm)
! style="background:silver; color:black" | PMMA 950k
! style="background:silver; color:black" | PMMA 950k
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