Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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Table of dose to clear on Si substrate: | Table of dose to clear on Si substrate: | ||
{| border="2" cellspacing=" | ! colspan="3" style="text-align: center;" | Anneal Oxide | ||
! style="background:silver; color:black" | Dose [µC/cm2] | |||
{| border="2" cellspacing="1" cellpadding="1" align="center" | |||
! style="background:silver; color:black" colspan="3" | Dose [µC/cm2] | |||
|- valign="top" | |- valign="top" | ||
! style="background:silver; color:black" | Dose [µC/cm2] | ! style="background:silver; color:black" | Dose [µC/cm2] | ||
! style="background:silver; color:black" | AR-P 6200.09 (180 nm) | ! style="background:silver; color:black" | AR-P 6200.09 (180 nm) | ||
Revision as of 07:50, 13 June 2022
THIS PAGE IS UNDER CONSTRUCTION
Process information for the Raith eLINE Plus system
The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information.
Dose information
Table of dose to clear on Si substrate:
! colspan="3" style="text-align: center;" | Anneal Oxide
| Dose [µC/cm2] | |||
|---|---|---|---|
| Dose [µC/cm2] | AR-P 6200.09 (180 nm) | PMMA 950k | AR-N 8200.xx |
| 10 kV | 30 | ||
| 20 kV | 70 | ||
| 30 kV | 100 | ||