Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
Appearance
| Line 8: | Line 8: | ||
Table of dose to clear on Si substrate: | Table of dose to clear on Si substrate: | ||
{| border="2" cellspacing=" | ! colspan="3" style="text-align: center;" | Anneal Oxide | ||
! style="background:silver; color:black" | Dose [µC/cm2] | |||
{| border="2" cellspacing="1" cellpadding="1" align="center" | |||
! style="background:silver; color:black" colspan="3" | Dose [µC/cm2] | |||
|- valign="top" | |- valign="top" | ||
! style="background:silver; color:black" | Dose [µC/cm2] | ! style="background:silver; color:black" | Dose [µC/cm2] | ||
! style="background:silver; color:black" | AR-P 6200.09 (180 nm) | ! style="background:silver; color:black" | AR-P 6200.09 (180 nm) | ||