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Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Line 8: Line 8:
Table of dose to clear on Si substrate:
Table of dose to clear on Si substrate:


{| border="2" cellspacing="1" cellpadding="1" align="center"  
{| border="2" cellspacing="2" cellpadding="1" align="center"  
! style="background:silver; color:black" | Dose [µC/cm2]
! style="background:silver; color:black" | Dose [µC/cm2]
|- valign="top"
|- valign="top"
{| border="2" cellspacing="1" cellpadding="1" align="center"
! style="background:silver; color:black" | Dose [µC/cm2]
! style="background:silver; color:black" | Dose [µC/cm2]
! style="background:silver; color:black" | AR-P 6200.09 (180 nm)
! style="background:silver; color:black" | AR-P 6200.09 (180 nm)
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