Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
No edit summary |
|||
| Line 2: | Line 2: | ||
===Process information for the Raith eLINE Plus system=== | ===Process information for the Raith eLINE Plus system=== | ||
The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information. | |||
Table of dose to clear on Si substrate: | Table of dose to clear on Si substrate: | ||
Revision as of 10:22, 12 June 2022
THIS PAGE IS UNDER CONSTRUCTION
Process information for the Raith eLINE Plus system
The system was installed in the cleanroom in May 2022. As we get more familiar with the tool this page will be populated with relevant process information.
Table of dose to clear on Si substrate:
| Dose [µC/cm2] | AR-P 6200.09 (180 nm) | PMMA 950k | AR-N 8200.xx |
|---|---|---|---|
| 10 kV | 30 | ||
| 20 kV | 70 | ||
| 30 kV | 100 |