Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
| Line 6: | Line 6: | ||
{| border="2" cellspacing="1" cellpadding="1" align="center" | {| border="2" cellspacing="1" cellpadding="1" align="center" | ||
! style="background:silver; color:black" | Dose µC/cm2 | ! style="background:silver; color:black" | Dose [µC/cm2] | ||
! style="background:silver; color:black" | AR-P 6200.09 (180 nm) | ! style="background:silver; color:black" | AR-P 6200.09 (180 nm) | ||
! style="background:silver; color:black" | PMMA 950k | ! style="background:silver; color:black" | PMMA 950k | ||
Revision as of 11:36, 9 June 2022
THIS PAGE IS UNDER CONSTRUCTION
Process information for the Raith eLINE Plus system
Table of dose to clear on Si substrate:
| Dose [µC/cm2] | AR-P 6200.09 (180 nm) | PMMA 950k | AR-N 8200.xx |
|---|---|---|---|
| 10 kV | 25 | ||
| 20 kV | 45 | ||
| 30 kV | 70 |