Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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! style="background:lightgrey; color:black" | 10 kV
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| style="background:lightgrey; color:black" | 25
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! style="background:Whitesmoke; color:black" | 20 kV
! style="background:Whitesmoke; color:black" | 20 kV
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! style="background:WhiteSmoke; color:black" | 45
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! style="background:lightgrey; color:black" | 30 kV
! style="background:lightgrey; color:black" | 30 kV
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| style="background:lightgrey; color:black" | 70
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Revision as of 11:36, 9 June 2022

THIS PAGE IS UNDER CONSTRUCTION

Process information for the Raith eLINE Plus system

Table of dose to clear on Si substrate:

Dose µC/cm2 AR-P 6200.09 (180 nm) PMMA 950k AR-N 8200.xx
10 kV 25
20 kV 45
30 kV 70