Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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===Process information for the Raith eLINE Plus system=== | ===Process information for the Raith eLINE Plus system=== | ||
Table of dose to clear | Table of dose to clear on Si substrate: | ||
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Revision as of 11:35, 9 June 2022
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Process information for the Raith eLINE Plus system
Table of dose to clear on Si substrate:
| Dose µC/cm2 | AR-P 6200.09 (180 nm) | PMMA 950k | AR-N 8200.xx |
|---|---|---|---|
| 10 kV | |||
| 20 kV | |||
| 30 kV |