Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

Revision as of 11:34, 9 June 2022

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Process information for the Raith eLINE Plus system

Table of dose to clear

Dose µC/cm2	AR-P 6200.09 (180 nm)	PMMA 950k	AR-N 8200.xx
10 kV
20 kV
30 kV

@@ Line 6: / Line 6: @@
 {| border="2" cellspacing="1" cellpadding="1" align="center"
-! style="background:silver; color:black" | Dose µC/cm2]
+! style="background:silver; color:black" | Dose µC/cm2
-! style="background:silver; color:black" | AR-P 6200.09 (180 nm)]
+! style="background:silver; color:black" | AR-P 6200.09 (180 nm)
-! style="background:silver; color:black" | PMMA 950k]
+! style="background:silver; color:black" | PMMA 950k
-! style="background:silver; color:black" | AR-N 8200.xx]
+! style="background:silver; color:black" | AR-N 8200.xx
 |- valign="top"
 ! style="background:lightgrey; color:black" | 10 kV
@@ Line 25: / Line 25: @@
 | style="background:lightgrey; color:black" |
 | style="background:lightgrey; color:black" |
-|- valign="top"
-! style="background:Whitesmoke; color:black" | Hardware options
-| style="background:WhiteSmoke; color:black" |
-* [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|High flow plenum]]
-* [[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Picoscope oscilloscope]]
-*[[Specific Process Knowledge/Etch/DRIE-Pegasus/Claritas|Claritas optical endpoint system]]
-| style="background:WhiteSmoke; color:black"|
-* [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|High flow plenum]]
-* [[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Picoscope oscilloscope]]
-| style="background:WhiteSmoke; color:black"|
-* [[Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange|High flow plenum]]
-* [[Specific Process Knowledge/Etch/DRIE-Pegasus/picoscope|Picoscope oscilloscope]]
-| style="background:WhiteSmoke; color:black"| ?
-|-
 |}