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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,915 edits
Line 59: Line 59:
| Dev: SP60s
| Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| 2020-10-01<br>jehem
| 2021-03-23<br>jehem
| Quality
| Quality
| 70 mJ/cm<sup>2</sup>
| 65 mJ/cm<sup>2</sup>
| 0
| -2
| 1.25 µm
| 1 µm
| Dev: SP60s
| Dev: SP60s
|-
|-
Line 75: Line 75:
| 300 mJ/cm<sup>2</sup>
| 300 mJ/cm<sup>2</sup>
| 0
| 0
| 2 µm (due to stitching)
| 2 µm (due to stitching)<br>Non optimized dehydration reduction
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| 2020-10-01<br>jehem
| 2021-08-25<br>jehem
| Quality
| Quality
| 180-200 mJ/cm<sup>2</sup>
| 175 mJ/cm<sup>2</sup>
| 0
| -2
| 1 µm
| 1 µm<br>Tested using dehydration reducing measures
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-
|-
Line 97: Line 97:
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| 2020-10-01<br>jehem
| 2021-08-25<br>jehem
| Quality
| Quality
| 43 mJ/cm<sup>2</sup>
| 32 mJ/cm<sup>2</sup>
| 0
| -1
| 2 µm (due to stitching)
| 1 µm
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s
|-
|-
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