Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
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In the fast mode, each area of the pattern is exposed by 2 stripes only. This reduces the exposure time by 60%, but also increases the size of the address grid in the X-direction to 250nm. This means that alignment will be less accurate in fast mode. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | In the fast mode, each area of the pattern is exposed by 2 stripes only. This reduces the exposure time by 60%, but also increases the size of the address grid in the X-direction to 250nm. This means that alignment will be less accurate in fast mode. Due to less averaging of non-uniformities, stitching effects will be more prominent in this mode. | ||
'''Data represent dose-defocus tests on Si unless otherwise stated''' | |||
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!Thickness | |||
!Exposure mode | |||
!Dose | |||
!Defoc | |||
!Resolution | |||
!Comments | |||
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|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ 5214E | |||
|rowspan="2"| 1.5 µm | |||
| Fast | |||
| 70 mJ/cm<sup>2</sup> (Jehem Oct 2020) | |||
| 0 (Jehem Oct 2020) | |||
| 2 µm (due to stitching) | |||
| Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Quality | |||
| 70 mJ/cm<sup>2</sup> (Jehem Oct 2020) | |||
| 0 (Jehem Oct 2020) | |||
| 1.25 µm | |||
| Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ MiR 701 | |||
|rowspan="2"| 1.5 µm | |||
| Fast | |||
| 300 mJ/cm<sup>2</sup> (Jehem Feb 2020) | |||
| 0 (Jehem Feb 2020) | |||
| 2 µm (due to stitching) | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Quality | |||
| 180-200 mJ/cm<sup>2</sup> (Taran Mar 2020) | |||
| 0-1 (Jehem Mar 2020) | |||
| 1 µm | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ 5214E image reversal | |||
|rowspan="2"| 2.2 µm | |||
| Fast | |||
| 43 mJ/cm<sup>2</sup> (Taran Mar 2020) | |||
| 0 (Jehem Feb 2020) | |||
| >2 µm (a lot of stitching) | |||
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| Quality | |||
| 43 mJ/cm<sup>2</sup> (Taran Mar 2020) | |||
| 0 (Jehem Feb 2020) | |||
| 2 µm (due to stitching) | |||
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | |||
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'''AZ nLOF 2020''' has also been tested. It seems to work even at 405nm, but the dose is so high (>10000) that exposure would be slower than Aligner: Maskless 02. | |||
==Writing speed== | ==Writing speed== | ||