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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 02 processing: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,931 edits
Line 32: Line 32:
|-style="background:silver; color:black"
|-style="background:silver; color:black"
|
|
!Date
!Thickness
!Thickness
!Laser
!Laser
Line 43: Line 44:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ 5206E <sup>1)</sup>
!rowspan="2"| AZ 5206E<br>(AZ5214E diluted with PGMEA 1:1 per volume)<br><span style="color:red">Old German version</span>
| Long ago
|rowspan="2"| 0.5 µm
|rowspan="2"| 0.5 µm
|rowspan="2"| 375 nm
|rowspan="2"| 375 nm
Line 52: Line 54:
| Dev: 2xSP30s
| Dev: 2xSP30s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Long ago
| Quality
| Quality
| 60 mJ/cm<sup>2</sup>
| 60 mJ/cm<sup>2</sup>
Line 61: Line 64:
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!rowspan="3"| AZ 5214E
!rowspan="3"| AZ 5214E<br><span style="color:red">Old German version</span>
| Long ago
|rowspan="3"| 1.5 µm
|rowspan="3"| 1.5 µm
| 405 nm
| 405 nm
Line 70: Line 74:
| Dev: SP60s
| Dev: SP60s
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
| Long ago
|rowspan="2"| 375 nm
|rowspan="2"| 375 nm
| Fast
| Fast
Line 77: Line 82:
| Dev: SP60s
| Dev: SP60s
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
| Long ago
| Quality
| Quality
| 65 mJ/cm<sup>2</sup>
| 65 mJ/cm<sup>2</sup>
Line 86: Line 92:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="3"| AZ MiR 701
!rowspan="3"| AZ MiR 701<br><span style="color:red">Old PFOA containing version</span>
| Long ago
|rowspan="3"| 1.5 µm
|rowspan="3"| 1.5 µm
| 405 nm
| 405 nm
Line 95: Line 102:
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Long ago
|rowspan="2"| 375 nm
|rowspan="2"| 375 nm
| Fast
| Fast
Line 102: Line 110:
| PEB: 60s@110°C, Dev: SP60s
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Long ago
| Quality
| Quality
| 180 mJ/cm<sup>2</sup>
| 180 mJ/cm<sup>2</sup>
Line 112: Line 121:
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!rowspan="2"| AZ nLOF 2020
!rowspan="2"| AZ nLOF 2020
| Long ago
|rowspan="2"| 2 µm
|rowspan="2"| 2 µm
|rowspan="2"| 375 nm
|rowspan="2"| 375 nm
Line 120: Line 130:
| PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed
| PEB: 60s@110°C, Dev: SP60s <br> Probably under-exposed
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
| Long ago
| Quality
| Quality
| 400 mJ/cm<sup>2</sup>
| 400 mJ/cm<sup>2</sup>
Line 129: Line 140:
|}
|}


<sup>1)</sup> AZ5214E diluted with PGMEA 1:1 per volume.
<br>


{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
|
!Date
!Thickness
!Laser
!Autofocus
!Exposure mode
!Dose
!Defoc
!Resolution
!Comments
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 5214E<br><span style="color:green">New Japanese version</span>
| <br>jehem
| 1.5 µm
| 375
| Optical
| Fast
|  mJ/cm<sup>2</sup>
|
|  µm
| Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-
|-
|-style="background:LightGrey; color:black"
!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span>
| <br>jehem
| 2.2 µm
| 375
| Optical
| Fast
|  mJ/cm<sup>2</sup>
|
|  µm
| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ MiR 701<br><span style="color:green">New PFOA free version</span>
| <br>jehem
| 1.5 µm
| 375
| Optical
| Fast
|  mJ/cm<sup>2</sup>
|
|  µm<br>Tested using dehydration reducing measures
| PEB: 60s@110°C, Dev: SP60s
|-
|-
|-style="background:LightGrey; color:black"
!AZ 4562<br><span style="color:green">New Japanese version</span>
| <br>jehem
| 10 µm
| 375
| Optical
| Fast
|  mJ/cm<sup>2</sup>
|
|  µm
| Priming: HMDS<BR>Rehydration after SB: 1 hour (may not be necessary)<br>Exposure: Multiple exposures with pauses, 5 x (10 s exposure + 10 s pause)<br>Degassing after exposure: 1 hour (may not be necessary)<br>Development: Multiple puddles, 5 x 60 s
|-
|}




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