Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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==Exposure dose== | ==Exposure dose and defocus parameters== | ||
The exposure dose needed in the Aligner: Maskless 01 seems to follow the dose needed to process the same substrate in [[Specific_Process_Knowledge/Lithography/UVExposure_Dose#Aligner:_MA6_-_2|Aligner: MA6-2]]. As doses get higher, there is a tendency for the dose needed in the Aligner: Maskless 01 to exceed the dose needed in Aligner: MA6-2. | The exposure dose needed in the Aligner: Maskless 01 seems to follow the dose needed to process the same substrate in [[Specific_Process_Knowledge/Lithography/UVExposure_Dose#Aligner:_MA6_-_2|Aligner: MA6-2]]. As doses get higher, there is a tendency for the dose needed in the Aligner: Maskless 01 to exceed the dose needed in Aligner: MA6-2. | ||