Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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==Exposure dose== | ==Exposure dose== | ||
The exposure dose needed in the Aligner: Maskless 01 seems to follow the dose needed to process the same substrate in [[Specific_Process_Knowledge/Lithography/UVExposure_Dose#Aligner:_MA6_-_2|Aligner: MA6-2]]. As doses get higher, there is a tendency for the dose needed in the Aligner: Maskless 01 to exceed the dose needed in Aligner: MA6-2. | The exposure dose needed in the Aligner: Maskless 01 seems to follow the dose needed to process the same substrate in [[Specific_Process_Knowledge/Lithography/UVExposure_Dose#Aligner:_MA6_-_2|Aligner: MA6-2]]. As doses get higher, there is a tendency for the dose needed in the Aligner: Maskless 01 to exceed the dose needed in Aligner: MA6-2. | ||
'''Data represent dose-defocus tests on Si unless otherwise stated''' | |||
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!Date | |||
!Thickness | |||
!Exposure mode | |||
!Dose | |||
!Defoc | |||
!Resolution | |||
!Comments | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ 5214E | |||
| | |||
| 1.5 µm | |||
| Fast | |||
| 70 mJ/cm<sup>2</sup> (Jehem Oct 2020) | |||
| 0 (Jehem Oct 2020) | |||
| 2 µm (due to stitching) | |||
| Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| | |||
| 1.5 µm | |||
| Quality | |||
| 70 mJ/cm<sup>2</sup> (Jehem Oct 2020) | |||
| 0 (Jehem Oct 2020) | |||
| 1.25 µm | |||
| Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ 5214E image reversal | |||
| | |||
| 2.2 µm | |||
| Fast | |||
| 43 mJ/cm<sup>2</sup> (Taran Mar 2020) | |||
| 0 (Jehem Feb 2020) | |||
| >2 µm (a lot of stitching) | |||
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| | |||
| 2.2 µm | |||
| Quality | |||
| 43 mJ/cm<sup>2</sup> (Taran Mar 2020) | |||
| 0 (Jehem Feb 2020) | |||
| 2 µm (due to stitching) | |||
| Reversal bake: 120s@110°C, Flood exposure: 200mJ/cm<sup>2</sup>, Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ MiR 701 | |||
| | |||
| 1.5 µm | |||
| Fast | |||
| 300 mJ/cm<sup>2</sup> (Jehem Feb 2020) | |||
| 0 (Jehem Feb 2020) | |||
| 2 µm (due to stitching) | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| | |||
| 1.5 µm | |||
| Quality | |||
| 180-200 mJ/cm<sup>2</sup> (Taran Mar 2020) | |||
| 0-1 (Jehem Mar 2020) | |||
| 1 µm | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|- | |||
|- | |||
|-style="background:WhiteSmoke; color:black" | |||
!rowspan="2"| AZ nLOF 2020 | |||
| | |||
| 2.0 µm | |||
| Fast | |||
| 300 mJ/cm<sup>2</sup> (Jehem Feb 2020) | |||
| 0 (Jehem Feb 2020) | |||
| 2 µm (due to stitching) | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|-style="background:WhiteSmoke; color:black" | |||
| | |||
| 2.0 µm | |||
| Quality | |||
| 180-200 mJ/cm<sup>2</sup> (Taran Mar 2020) | |||
| 0-1 (Jehem Mar 2020) | |||
| 1 µm | |||
| PEB: 60s@110°C, Dev: SP60s | |||
|- | |||
|} | |||
==Defocus== | ==Defocus== | ||