Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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|[https://www.allresist.com/wp-content/uploads/sites/2/2022/03/Allresist_Product-information-E-Beamresist-AR-N-7520new-English-web.pdf AR-N 7520 info] | |[https://www.allresist.com/wp-content/uploads/sites/2/2022/03/Allresist_Product-information-E-Beamresist-AR-N-7520new-English-web.pdf AR-N 7520 info] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | ||
|AR 300-12 | |AR 300-12 / PGMEA | ||
|AR 300-47 | |AR 300-47 | ||
| | |DIW | ||
|AR 300-73 | |AR 300-73 | ||
| a = ?, b = ? | | a = ?, b = ? | ||