Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | ||
|Anisole | |Anisole | ||
|AR-600-546 | |AR-600-546 | ||
|IPA | |IPA | ||
| | |1165 Remover | ||
| a = 7252.2, b = -0.454 | | a = 7252.2, b = -0.454 | ||
|180C, 3-10 min | |180C, 3-10 min | ||