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==General workflow==
==General workflow==
The general workflow of E-beam lithography on the JEOL 9500 system is somewhat similar to that of UV lithography with a few added steps. The general workflow is
The general workflow of E-beam lithography on the JEOL 9500 system is summarized below. In order to optimize usage of the system steps 1 to x should all be done ahead of the booked session on the 9500 system.  


*Resist coating and baking
*Resist coating and baking
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