Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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#8 Cassette from auto stocker shelf 8 is used | #8 Cassette from auto stocker shelf 8 is used | ||
%4A 4" wafer in position A is exposed | %4A 4" wafer in position A is exposed | ||
JDF 'myfirstebl',1 | JDF 'myfirstebl',1 Layer block no. 1 of the jdf-file 'myfirstebl.jdf' is exposed | ||
ACC 100 Acceleration voltage of 100keV is used (can not be changed) | ACC 100 Acceleration voltage of 100keV is used (can not be changed) | ||
CALPRM '6na_ap5' The condition file 6na_ap5 is used, i.e. exposure at 6 nA | CALPRM '6na_ap5' The condition file 6na_ap5 is used, i.e. exposure at 6 nA | ||