Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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=General workflow= | =General workflow= | ||
The general workflow of E-beam lithography is somewhat similar to that of UV lithography with a few added steps. The general workflow is | The general workflow of E-beam lithography on the JEOL 9500 system is somewhat similar to that of UV lithography with a few added steps. The general workflow is | ||
*Resist coating and baking | *Resist coating and baking | ||
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|'''Resist''' | |'''Resist''' | ||
|'''Polarity''' | |'''Polarity''' | ||
|''' | |'''Manufacturer guidelines''' | ||
|'''Spin Coater''' | |'''Spin Coater''' | ||
|'''Thinner''' | |'''Thinner''' | ||