Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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The JEOL 9500 E-beam writer offers world class performance this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. In this guide we will set up a simple wafer/chip exposure. The complexity is kept at a relatively low level and we encourage new users to make sure their first job (first training session) matches this complexity level. More complex jobs can be run when a user is more familiar with the system. | The JEOL 9500 E-beam writer offers world class performance this however comes at a price of a fairly steep learning curve. This page is specifically intended to guide new users through their very first exposure on the system. In this guide we will set up a simple wafer/chip exposure. The complexity is kept at a relatively low level and we encourage new users to make sure their first job (first training session) matches this complexity level. More complex jobs can be run when a user is more familiar with the system. | ||
General workflow | =General workflow= | ||
The general workflow of E-beam lithography is somewhat similar to that of UV lithography with a few added steps. The general workflow is | The general workflow of E-beam lithography is somewhat similar to that of UV lithography with a few added steps. The general workflow is | ||