Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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|Standard positive resist, very similar to ZEP520. | |Standard positive resist, very similar to ZEP520. | ||
|[[media:Allresist_CSAR62_English.pdf|Allresist CSAR62 info sheet]] | |[[media:Allresist_CSAR62_English.pdf|Allresist CSAR62 info sheet]] | ||
| | |[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]] or [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: Labspin 02/03]] | ||
|Anisole | |Anisole | ||
|AR-600-546, AR-600-548, N50, MIBK:IPA | |AR-600-546, AR-600-548, N50, MIBK:IPA | ||