Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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===My First E-Beam Lithography Process=== | ===My First E-Beam Lithography Process=== | ||
This page is a step by step guide to help new users through their ''first exposure'' on the JEOL 9500 system. In this guide we will set up an exposure job as an example. We will set it up as a dose test and hence keep it at a fairly low complexity level. We encourage all users to keep the complexity level of their first exposure similar to the job in this guide. | This page is a step by step guide to help new users through their '''first exposure''' on the JEOL 9500 system. In this guide we will set up an exposure job as an example. We will set it up as a dose test and hence keep it at a fairly low complexity level. We encourage all users to keep the complexity level of their first exposure similar to the job in this guide. | ||
Revision as of 20:37, 27 March 2022
Under construction, step by step guide to a users first EBL process
My First E-Beam Lithography Process
This page is a step by step guide to help new users through their first exposure on the JEOL 9500 system. In this guide we will set up an exposure job as an example. We will set it up as a dose test and hence keep it at a fairly low complexity level. We encourage all users to keep the complexity level of their first exposure similar to the job in this guide.
The job set up in this guide will go through the following steps
- Spin coating of e-beam resist
- Job file preparation
- Pattern preparation
- Exposure
- Development