Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions

Revision as of 20:37, 27 March 2022

Under construction, step by step guide to a users first EBL process

My First E-Beam Lithography Process

This page is a step by step guide to help new users through their first exposure on the JEOL 9500 system. In this guide we will set up an exposure job as an example. We will set it up as a dose test and hence keep it at a fairly low complexity level. We encourage all users to keep the complexity level of their first exposure similar to the job in this guide.

The job set up in this guide will go through the following steps

Spin coating of e-beam resist
Job file preparation
Pattern preparation
Exposure
Development

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 ===My First E-Beam Lithography Process===
-E-beam lithography and the JEOL 9500 exposure system can be a bit challenging to learn. To help new users along we have set up this page as a step by step guide to your first exposure on the JEOL 9500. For this purpose we will setup a dose test job as an example. This job is fairly simple but it should cover the needs of most users for their first exposure. We strongly encourage users to make sure their first job follows this guide and matches the job defined in this guide in complexity level.
+This page is a step by step guide to help new users through their ''first exposure'' on the JEOL 9500 system. In this guide we will set up an exposure job as an example. We will set it up as a dose test and hence keep it at a fairly low complexity level. We encourage all users to keep the complexity level of their first exposure similar to the job in this guide.
 The job set up in this guide will go through the following steps