Specific Process Knowledge/Lithography/EBeamLithography/FirstEBL: Difference between revisions
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===My First E-Beam Lithography Process=== | ===My First E-Beam Lithography Process=== | ||
E-beam lithography and the JEOL 9500 exposure system can be a bit challenging to learn. To help new users along we have set up this page as a step by step guide to your first exposure on the JEOL 9500. For this purpose we will setup a dose test job as an example. This job is fairly simple but it should cover the needs of most users for their first exposure. We strongly encourage users to make sure their first job follows this guide and matches the job defined in this guide in complexity level. | |||
The job set up in this guide will go through the following steps | |||
*Spin coating of e-beam resist | |||
*Job file preparation | |||
*Pattern preparation | |||
*Exposure | |||
*Development | |||
Revision as of 11:24, 26 March 2022
Under construction, step by step guide to a users first EBL process
My First E-Beam Lithography Process
E-beam lithography and the JEOL 9500 exposure system can be a bit challenging to learn. To help new users along we have set up this page as a step by step guide to your first exposure on the JEOL 9500. For this purpose we will setup a dose test job as an example. This job is fairly simple but it should cover the needs of most users for their first exposure. We strongly encourage users to make sure their first job follows this guide and matches the job defined in this guide in complexity level.
The job set up in this guide will go through the following steps
- Spin coating of e-beam resist
- Job file preparation
- Pattern preparation
- Exposure
- Development