Specific Process Knowledge/Lithography/ARN8200: Difference between revisions
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Hotplate temperatures are assumed surface temperatures based on the 0.90 correction factor in use on the hotplate. | Hotplate temperatures are assumed surface temperatures based on the 0.90 correction factor in use on the hotplate. | ||
The resulting resist structure height is mapped with Dektak XTa and plotted as a contrast curve below. It is apparent that the dose and contrast is very dependent on the PEB parameters. | |||
[[file:ARN8200DoseCurve.png]] | [[file:ARN8200DoseCurve.png]] | ||