Specific Process Knowledge/Lithography/ARN8200: Difference between revisions

Revision as of 09:32, 17 March 2022

AR-N 8200

AR-N 8200 is a negative E-beam resist from Allresist, it is also known as "Medusa 82". A product presentation from Allresist is available here AR-N8200 presentation.

Allresist also provides these processing guidelines.

Contrast curve

Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained with the following process parameters.

AR-N 8200 Contrast Curve, Processed by THOPE, FEB 2022
Resist	Spin Coat	E-beam exposure	PEB	Development
AR-N8200.06	LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC	JBX9500, 60 nA, doses 100-1600 µC/cm2, 150 µm x 300 µm rectangles	Labspin 2 hotplate, 130, 150, 160 or 170 degC for 10 min	EBL development fumehood, 60 sec development in AR300-47:DIW (1:1), 30 sec rinse in DIW, nitrogen gun dry

Spin coating Labspin 2

@@ Line 28: / Line 28: @@
 |-
 |-style="background:WhiteSmoke; color:black"
-|AR-N8200.06 AllResist
+|AR-N8200.06
-|LabSpin E-5, 4000 rpm, 60s, softbaked 10 min @ 150 degC
+|LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC
-|09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces
+|JBX9500, 60 nA, doses 100-1600 µC/cm2, 150 µm x 300 µm rectangles
-|11-02-2016, Fumehood D-2, AR-600-546, rinsed in IPA 60s.
+|Labspin 2 hotplate, 130, 150, 160 or 170 degC for 10 min
-|02-03-2016 AFM Icon, F-2, ScanAsyst in Air
+|EBL development fumehood, 60 sec development in AR300-47:DIW (1:1), 30 sec rinse in DIW, nitrogen gun dry
 |-