Specific Process Knowledge/Lithography/ARN8200: Difference between revisions
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== Contrast curve == | == Contrast curve == | ||
Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained | Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained with the following process parameters. | ||
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