Specific Process Knowledge/Lithography/ARN8200: Difference between revisions
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== Contrast curve == | == Contrast curve == | ||
Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained | Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained with the following process parameters. | ||
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Revision as of 09:25, 17 March 2022
AR-N 8200
AR-N 8200 is a negative E-beam resist from Allresist, it is also known as "Medusa 82". A product presentation from Allresist is available here AR-N8200 presentation.
Allresist also provides these processing guidelines.
Contrast curve
Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained with the following process parameters.
| AR-N 8200 Contrast Curve, Processed by THOPE, FEB 2022 | ||||
|---|---|---|---|---|
| Resist | Spin Coat | E-beam exposure | PEB | Development |
| AR-N8200.06 AllResist | LabSpin E-5, 4000 rpm, 60s, softbaked 10 min @ 150 degC | 09-02-2016, JBX9500 E-2, 2nA aperture 5, doses 40-600 µC/cm2, 100 nm lines and 300 nm spaces | 11-02-2016, Fumehood D-2, AR-600-546, rinsed in IPA 60s. | 02-03-2016 AFM Icon, F-2, ScanAsyst in Air |
Spin coating Labspin 2
