Specific Process Knowledge/Lithography/ARN8200: Difference between revisions
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== Contrast curve == | == Contrast curve == | ||
Exposure dose requirement for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained by the following process. | |||
Spin coating | |||
Labspin 2 | |||
[[file:ARN8200DoseCurve.png]] | [[file:ARN8200DoseCurve.png]] | ||
Revision as of 16:47, 16 March 2022
AR-N 8200
AR-N 8200 is a negative E-beam resist from Allresist, it is also known as "Medusa 82". It is currently (Februrary 2022) being tested at DTU Nanolab.
Contrast curve
Exposure dose requirement for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained by the following process.
Spin coating Labspin 2
