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Specific Process Knowledge/Lithography/ARN8200: Difference between revisions

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== Contrast curve ==
== Contrast curve ==
Exposure dose requirement for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained by the following process.
Spin coating
Labspin 2




[[file:ARN8200DoseCurve.png]]
[[file:ARN8200DoseCurve.png]]