Specific Process Knowledge/Lithography/Descum: Difference between revisions
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[[image:AZ5214E_pressure_settings.png|right|frame|400x400px| Descum results for different pressure settings]] | [[image:AZ5214E_pressure_settings.png|right|frame|400x400px| Descum results for different pressure settings]] | ||
Recipe settings: | |||
Kept power setting constant at Power: 100% and vary oxydgen flow during process. | |||
Experiment parameters: | |||
{| {{table}} | |||
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{| border="1" cellspacing="1" cellpadding="2" align="center" | |||
|- style="background:LightGrey" | |||
| ||FW/REV|| C2/C1 || Oxydgen || Pressure | |||
|- | |||
|'''recipe 1'''|| 100/0 || 53/31 || 17 || 0,4 | |||
|- | |||
|'''recipe 2''' || 100/0 || 37/39 || 45 || 0,8 | |||
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|} | |||
|} | |||
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