Specific Process Knowledge/Lithography/Descum: Difference between revisions
| Line 177: | Line 177: | ||
Pressure: 0,2mbar | Pressure: 0,2mbar | ||
Experiment parameters: | |||
{| {{table}} | |||
| align="center" | | |||
{| border="1" cellspacing="1" cellpadding="2" align="center" | |||
|- style="background:LightGrey" | |||
| ||FW/REV|| C2/C1 || Power | |||
|- | |||
|'''recipe 1''' || 50/0 || 52/31 || 50% | |||
|- | |||
|'''recipe 2''' || 100/0 || 53/31 || 100% | |||
|- | |||
|'''recipe 3''' || 20/0 || 51/34 || 20% | |||
|- | |||
|} | |||
|} | |||
Ashing of AZ5214E resist | Ashing of AZ5214E resist | ||