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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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Thope (talk | contribs)
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|[[media:Process Flow HSQ.docx|process flow HSQ]]
|[[media:Process Flow HSQ.docx|process flow HSQ]]
[[/High resolution patterning with HSQ|High resolution patterning with HSQ]]
[[/High resolution patterning with HSQ|High resolution patterning with HSQ]]
|-
|-style="background:LightGrey; color:black"
|'''AR-N 8200'''
|Negative
|[http://www.allresist.com AllResist]
|Both e-beam and DUV sensitive resist. Currently being tested, contact [mailto:thope@dtu.dk Thomas Pedersen] for information.
|
|
|
|AR 300-47
|H2O
|
|
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography"