LabAdviser/314/Microscopy 314-307/FIB/Hydra: Difference between revisions
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=Technical Notes = | =Technical Notes = | ||
'''Resolution''' | |||
* Electron beam: | |||
** At optimum WD: 0.7 nm at 1 kV • 1.0 nm at 500 V (ICD) | |||
** At coincident point: 0.6 nm at 15 kV • 1.2 nm at 1 kV | |||
* Xe Ion beam resolution at coincident point: | |||
** <20 nm at 30 kV using preferred statistical method | |||
** <10 nm at 30 kV using selective edge method | |||
'''Attachments''' | |||
- MultiChem Gas Injection System (GIS) ''for W and Pt both E and I beams. C deposition E beam only. XeF2 and H2O etching Ion beam only.'' | |||
- Thermo Scientific EasyLift™ NanoManipulator for precise in situ sample manipulation | |||
- EBSD | |||
- EDS detector | |||
- Integrated plasma cleaner | |||
May have: (need to check) | |||
- Thermo Scientific CryoCleaner Decontamination Device | |||
- WDS | |||
To find the basic instructions for operating the instrument, the reader is referred to the labmanager manual. | |||
=Important Notes= | =Important Notes= | ||
Revision as of 11:01, 8 February 2022
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Helios 5 Hydra UX DualBeam
Reading Materials
Technical Notes
Resolution
- Electron beam:
- At optimum WD: 0.7 nm at 1 kV • 1.0 nm at 500 V (ICD)
- At coincident point: 0.6 nm at 15 kV • 1.2 nm at 1 kV
- Xe Ion beam resolution at coincident point:
- <20 nm at 30 kV using preferred statistical method
- <10 nm at 30 kV using selective edge method
Attachments
- MultiChem Gas Injection System (GIS) for W and Pt both E and I beams. C deposition E beam only. XeF2 and H2O etching Ion beam only.
- Thermo Scientific EasyLift™ NanoManipulator for precise in situ sample manipulation
- EBSD
- EDS detector
- Integrated plasma cleaner
May have: (need to check)
- Thermo Scientific CryoCleaner Decontamination Device
- WDS
To find the basic instructions for operating the instrument, the reader is referred to the labmanager manual.