Specific Process Knowledge/Characterization: Difference between revisions
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===[[/Optical microscope|Optical microscope]]=== | ===[[/Optical microscope|Optical microscope]]=== | ||
===[[/Optical characterization|Optical characterization]]=== | ===[[/Optical characterization|Optical characterization]]=== | ||
*Ellipsometer | *[[/Optical characterization#Ellipsometer|Ellipsometer]] | ||
*Filmtek | *[[/Optical characterization#Filmtek_4000|Filmtek 4000]] | ||
*Prism Coupler | *[[/Optical characterization#Prism_Coupler|Prism Coupler]] | ||
===[[/SIMS: Secondary Ion Mass Spectrometry|SIMS: Secondary Ion Mass Spectrometry]]=== | ===[[/SIMS: Secondary Ion Mass Spectrometry|SIMS: Secondary Ion Mass Spectrometry]]=== | ||
*Atomika SIMS | *Atomika SIMS | ||
Revision as of 08:56, 29 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Measurement of optical constants
- Film thickness measurement
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy
AFM: Atomic Force Microscopy
Profiler
Optical microscope
Optical characterization
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS