Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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==Stylus Profiler (Tencor P17) [[Image:section under construction.jpg|70px]]== | ==Stylus Profiler (Tencor P17) [[Image:section under construction.jpg|70px]]== | ||
The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and | The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and submicrometer range as well as stress mapping and roughness measurements. It has more advanced options for stress measurements than the Dektak XTA and allows the user to measure a stress map with down to 5° radial resolution. | ||
A line profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure many parallel scans, mapping out a surface, or to program a sequence of scans in different locations on a wafer defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films on a wafer can be done by measuring the wafer's curvature. | A line profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure many parallel scans, mapping out a surface, or to program a sequence of scans in different locations on a wafer defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films on a wafer can be done by measuring the wafer's curvature. | ||
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A disadvantage of the P17 is that is can be hard to locate the structures one wants to measure as the maximum field of view of the camera is 1x1.5 mm. We recommend knowing your sample well or having a picture of the sample design available so you can easily locate the features of interest. | A disadvantage of the P17 is that is can be hard to locate the structures one wants to measure as the maximum field of view of the camera is 1x1.5 mm. We recommend knowing your sample well or having a picture of the sample design available so you can easily locate the features of interest. | ||
Otherwise the P17 is easy to use, fast and | Otherwise the P17 is easy to use, fast and very reliable in its measurement accuracy, just like the DektakXT. | ||
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||
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===Equipment performance and process related parameters Stylus Profiler (Tencor P17)=== | ===Equipment performance and process related parameters Stylus Profiler (Tencor P17)=== | ||
[[image:KLA-Tencor P17 profiler.JPG|275x275px|right|thumb|Front of the P17 profiler located in cleanroom F-2.]] | |||
{| border="2" cellspacing="0" cellpadding="10" | {| border="2" cellspacing="0" cellpadding="10" | ||
|- | |- | ||
!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"|Profiler for measuring | |style="background:LightGrey; color:black"|Profiler for measuring microstructures||style="background:WhiteSmoke; color:black"| | ||
*Single line profiles | *Single line profiles | ||
*Wafer mapping | *Wafer mapping | ||
*[[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] by measuring wafer bow | *[[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] by measuring the wafer bow | ||
*Surface roughness on a line scan | *Surface roughness on a line scan | ||
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|style="background:LightGrey; color:black"|Scan range x y | |style="background:LightGrey; color:black"|Scan range x y | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Line scan x: | Line scan x: up to 200 mm in a single scan. No stitching. | ||
Map scan xy: any rectangle that can be inscribed in a 200 mm circle but note limited resolution (max. 4 million points) | |||
- | |||
|style="background:LightGrey; color:black"|Scan range z | |style="background:LightGrey; color:black"|Scan range z | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
50 | 50 nm to 900 µm (it is possible to measure smaller steps but not recommended as the results may not be accurate) | ||
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|style="background:LightGrey; color:black"|Resolution x y | |style="background:LightGrey; color:black"|Resolution x y | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Down to 0. | Down to 0.025 µm | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Resolution z | |style="background:LightGrey; color:black"|Resolution z | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.01 Å, 0.08 Å, or 0.6 Å according to the manufacturer for ranges 13 µm, 131 µm, and 1 mm.* | |||
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|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence) | |style="background:LightGrey; color:black"|Height accuracy z (95 % confidence) | ||
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|} | |} | ||
*The resolution for the smallest range is theoretical, as this is below the noise threshold at least in our lab. | |||
===Height measurement accuracy for the Tencor P17 Stylus Profiler === | ===Height measurement accuracy for the Tencor P17 Stylus Profiler === | ||