Specific Process Knowledge/Characterization/Profiler: Difference between revisions
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==Stylus Profiler (Tencor P17) [[Image:section under construction.jpg|70px]]== | ==Stylus Profiler (Tencor P17) [[Image:section under construction.jpg|70px]]== | ||
The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and nanometer range | The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and nanometer range as well as stress mapping and roughness measurements. It has more advanced options for stress measurements than the Dektak XTA and allows the user to measure a stress map with down to 5° radial resolution. | ||
A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure a sequence of scans defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films on a wafer can be done by measuring the wafer's curvature. | A line profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure many parallel scans, mapping out a surface, or to program a sequence of scans in different locations on a wafer defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films on a wafer can be done by measuring the wafer's curvature. | ||
A disadvantage of the P17 is that is can be hard to locate the structures one wants to measure as the maximum field of view of the camera is 1x1.5 mm. We recommend knowing your sample well or having a picture of the sample design available so you can easily locate the features of interest. | |||
Otherwise the P17 is easy to use, fast and just like the Dektak XT is is very reliable in its measurement accuracy. | |||
'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:''' | ||