Jump to content

Specific Process Knowledge/Wafer and sample drying/Critical Point Dryer: Difference between revisions

Kn (talk | contribs)
No edit summary
Kn (talk | contribs)
No edit summary
Line 1: Line 1:
'''Critical Point Dryer'''
==Critical Point Dryer==
 
[[Image:CPD.JPG|300x300px|thumb|Critical point dryer: positioned in cleanroom 4]]
[[Image:CPD.JPG|300x300px|thumb|Critical point dryer: positioned in cleanroom 4]]
The critical point dryer is used to dry fragile structures that may be damaged in a normal drying procedure. Fragile structures may be thin membranes, or free hanging structures like cantilevers and grippers.  
The critical point dryer is used to dry fragile structures that may be damaged in a normal drying procedure. Fragile structures may be thin membranes, or free hanging structures like cantilevers and grippers.  
Line 48: Line 49:




'''Comparison of samples dried in air and with Critical Point Dryer'''
==Comparison of samples dried in air and with Critical Point Dryer==


This shows a comparison of samples that have been dried in the critical point dryer, and samples that have been dried in air.  
This shows a comparison of samples that have been dried in the critical point dryer, and samples that have been dried in air.