Specific Process Knowledge/Characterization: Difference between revisions
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===[[/Profiler|Profiler]]=== | ===[[/Profiler|Profiler]]=== | ||
*[[Dektak 8 stylus profiler]] | *[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | ||
*Tencor | *[[/Profiler#Tencor_stylus_profiler|Tencor stylus profiler]] | ||
===[[/Optical microscope|Optical microscope]]=== | ===[[/Optical microscope|Optical microscope]]=== | ||
Revision as of 08:52, 29 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Measurement of optical constants
- Film thickness measurement
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy
AFM: Atomic Force Microscopy
Profiler
Optical microscope
Optical characterization
- Ellipsometer
- Filmtek
- Prism Coupler
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS