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Specific Process Knowledge/Thin film deposition/Deposition of Gold/Adhesion layers: Difference between revisions

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The deposition of metal thin-film structures on dielectric or semiconductor substrates is important in a wide range of micro/nanofabrication applications (plasmonics, metamaterials, organic transistors, substrates for graphene growth, field effect devices).
The deposition of metal thin-film structures on dielectric or semiconductor substrates is important in a wide range of micro/nanofabrication applications (plasmonics, metamaterials, organic transistors, substrates for graphene growth, field effect devices).


Noble metals such as Au, Ag, and Pt are often used for the fabrication of these structures. Noble metals are preferred for their high thermal and electrical conductivities, strong and unique optical resonances in the visible and near-infrared (NIR) region of the electromagnetic spectrum due to the resonant response of their free electrons to the electric field of light, and chemical inertness. However, their chemical inertness is also a problem during the fabrication process, because the layers adhere poorly to the substrate, leading to different phenomena like delamination, peeling and deterioration of device performance over time.
Noble metals such as Au, Ag, and Pt are often used for the fabrication of these structures. Noble metals are preferred for their high thermal and electrical conductivities, strong and unique optical resonances in the visible and near-infrared (NIR) region of the electromagnetic spectrum due to the resonant response of their free electrons to the electric field of light, and chemical inertness. However, their chemical inertness is also a problem during the fabrication process, because the layers adhere poorly to the substrate, leading to different phenomena like delamination, peeling and deterioration of device performance over time


An empiric approach has been applied to the adhesion enhancement, leading to the application of extremely thin adhesion layers between the substrate and the noble metal films. The most used of these adhesion layers are transition metals like Ti and Cr, but the advantages of using these materials as adhesion layers are poorly understood.
An empiric approach has been applied to the adhesion enhancement, leading to the application of extremely thin adhesion layers between the substrate and the noble metal films. The most used of these adhesion layers are transition metals like Ti and Cr, but the advantages of using these materials as adhesion layers are poorly understood.