Specific Process Knowledge/Characterization: Difference between revisions
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===[[/AFM: Atomic Force Microscopy|AFM: Atomic Force Microscopy]]=== | ===[[/AFM: Atomic Force Microscopy|AFM: Atomic Force Microscopy]]=== | ||
*Nanoman - ''AFM'' | *[[/AFM: Atomic Force Microscopy#Nanoman|Nanoman - ''AFM'']] | ||
===[[/Profiler|Profiler]]=== | ===[[/Profiler|Profiler]]=== | ||
Revision as of 08:49, 29 October 2007
Choose topic
- Surface imaging
- Topographic measurement
- Stress measurement
- Measurement of optical constants
- Film thickness measurement
- Wafer thickness measurement
- Element analysis
- Hydrophobicity measurement
- Resistivity measurement
- Other electrical measurements
Choose equipment
SEM: Scanning Electron Microscopy
AFM: Atomic Force Microscopy
Profiler
- Dektak 8 stylus profiler
- Tencor
Optical microscope
Optical characterization
- Ellipsometer
- Filmtek
- Prism Coupler
SIMS: Secondary Ion Mass Spectrometry
- Atomika SIMS