Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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Some users have reported residues and residual layers when using ZED N-50 on CSAR and vice verca, hence we recommend to use AR 600-546 or AR 600-548 (3 times stronger) to develop CSAR and not ZED N-50. | Some users have reported residues and residual layers when using ZED N-50 on CSAR and vice verca, hence we recommend to use AR 600-546 or AR 600-548 (3 times stronger) to develop CSAR and not ZED N-50. | ||
When this is said some users still observe residues when using AR 600-546, "'''All resist'''" have recommended to use 3-5s, dip in pure MIBK to remove residues. | When this is said some users still observe residues when using AR 600-546, the producer "'''All resist GMBH'''" have recommended to use 3-5s, dip in pure MIBK to remove residues. | ||
AR 600 546 will dissolve different plastic materials, hence never use it on PS compounds. | AR 600 546 will dissolve different plastic materials, hence never use it on PS compounds. | ||