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Specific Process Knowledge/Lithography/EBeamLithography/BEAMER: Difference between revisions

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|[[File:beamer3.jpg|350px|right]]
|[[File:beamer3.jpg|350px|right]]
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| Import a GDSII-file by dragging the 'Import' module to the process flow area. Select the file. In the 'Import Layout' window, type the layer number to import or type * if you wish to import all layers. || Export the GDSII file to v30 by dragging an 'Export' module on top of the 'Import' icon. An 'Export JEOL' window appears.  || In the tab 'General' of this export window, choose JBX9300FS (100kV). In the tab 'Advanced', type the correct field size (maximum is 1000 mm in both X and Y). The fields will be distributed automatically by choosing 'Fixed'. In case you have small patterns, is it recommended to tick 'Center to Field'.
| Import a GDSII-file by dragging the 'Import' module to the process flow area. Select the file. In the 'Import Layout' window, type the layer number to import or type * if you wish to import all layers. || Export the GDSII file to v30 by dragging an 'Export' module on top of the 'Import' icon. An 'Export JEOL' window appears.  || In the tab 'General' of this export window, choose JBX9500FS (100kV). In the tab 'Advanced', type the correct field size (maximum is 1000 mm in both X and Y). The fields will be distributed automatically by choosing 'Fixed'. In case you have small patterns, is it recommended to tick 'Center to Field'.
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