Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide/By Peixiong/images CF4: Difference between revisions

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Revision as of 15:03, 18 August 2021

Images stepper_6A1_feb262013_step9

  • 6A1_feb262013_step9

Images stepper_6A4_feb262013_step9

  • 6A4_feb262013_step9
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • Position of the scanning: wafer edge
    Position of the scanning: wafer edge
  • wafer edge
    wafer edge
  • wafer edge
    wafer edge
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center
  • wafer center
    wafer center

Images Stepper_6A5_feb272013

  • 6A5_feb262013 step9 and step10
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer edge
    Wafer edge
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Wafer center
    Wafer center
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view
  • Top view
    Top view

images 3

  • 6A1_feb262013_step9

End

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