Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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| width="50" align="center" style="background:#f0f0f0;"|'''HMDS''' | | width="50" align="center" style="background:#f0f0f0;"|'''HMDS''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''Dip/spin-on adhesion promoter''' | | width="50" align="center" style="background:#f0f0f0;"|'''Dip/spin-on adhesion promoter''' | ||
| width="50" align="center" style="background:#f0f0f0;"|'''Comment''' | |||
|- | |- | ||
|-style="background:#DCDCDC;" align="center" | |-style="background:#DCDCDC;" align="center" | ||
|align="left"| Silicon with native oxide || (x) || x || x || (x) | |align="left"| Silicon with native oxide || (x) || x || x || (x) || | ||
|- | |- | ||
|-style="background:#C0C0C0;" align="center" | |-style="background:#C0C0C0;" align="center" | ||
|align="left"|Silicon oxide || (x) || || x || (x) | |align="left"|Silicon oxide || (x) || || x || (x) || | ||
|- | |- | ||
|-style="background:#DCDCDC;" align="center" | |-style="background:#DCDCDC;" align="center" | ||
|align="left"| Silicon nitride || (x) || || x || (x) | |align="left"| Silicon nitride || (x) || || x || (x) || | ||
|- | |- | ||
|-style="background:#C0C0C0;" align="center" | |||
|align="left"| Glass (borofloat/pyrex) || x || || x || (x) || Dehydration before HMDS for best result | |||
|- | |||
|-style="background:#DCDCDC;" align="center" | |||
|align="left"| Fused silica || x || || x || (x) || Dehydration before HMDS for best result | |||
|} | |} | ||
=HMDS= | =HMDS= | ||