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Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions

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|  width="50" align="center" style="background:#f0f0f0;"|'''HMDS'''
|  width="50" align="center" style="background:#f0f0f0;"|'''HMDS'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Dip/spin-on adhesion promoter'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Dip/spin-on adhesion promoter'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Comment'''
|-
|-
|-style="background:#DCDCDC;" align="center"
|-style="background:#DCDCDC;" align="center"
|align="left"| Silicon with native oxide || (x) || x || x || (x)
|align="left"| Silicon with native oxide || (x) || x || x || (x) ||
|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:#C0C0C0;" align="center"
|align="left"|Silicon oxide || (x) ||  || x || (x)
|align="left"|Silicon oxide || (x) ||  || x || (x) ||
|-
|-
|-style="background:#DCDCDC;" align="center"
|-style="background:#DCDCDC;" align="center"
|align="left"| Silicon nitride || (x) ||  || x || (x)
|align="left"| Silicon nitride || (x) ||  || x || (x) ||
|-
|-
|-style="background:#C0C0C0;" align="center"
|align="left"| Glass (borofloat/pyrex) || x ||  || x || (x) || Dehydration before HMDS for best result
|-
|-style="background:#DCDCDC;" align="center"
|align="left"| Fused silica || x ||  || x || (x) || Dehydration before HMDS for best result
|}
|}


=HMDS=
=HMDS=