Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions

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= The DREM processes =
= The DREM processes =
= DREM 2kW micro =
{{Template:Peg1RecipeTableVerBColors
|TableHeader=DREM 2kW micro
}}
{{Template:Peg1RecipeTableVerBAddrowColors
|RecipeName=DREM 2kW micro
|PriorProcessSteps=  Pump to base, Clamp Substrate, home platen matching unit, stabilisation
|Keywords=
|PlatenPosition=U          |PlatenFrequency=HF          |StabilisationTime=          |StartCycleEndCycle=D/E
|DepositionTime=1.2        |EtchTime=3                  |NumberOfCycles=
|PressureDepDelay=          |PressureDepBoost=          |PressureDepMain=100%
|PressureEtchDelay=        |PressureEtchBoost=          |PressureEtchMain=100%
|C4F8DepDelay=0.3@5        |C4F8DepBoost= 0.5@50        |C4F8DepMain=200
|C4F8EtchDelay=0.5@100      |C4F8EtchBoost=              |C4F8EtchMain=5
|SF6DepDelay=0.3@200        |SF6DepBoost=0.5@200        |SF6DepMain=15
|SF6EtchDelay=2@15          |SF6EtchBoost=0.3@100        |SF6EtchMain=200
|O2Dep=                    |O2Etch=                    |ArDep=150                        |ArEtch=150
|WCoilDep=2                |WCoilEtch=2                |WPlatenDep=1
|WPlatenEtchDelay=1@1      |WPlatenEtchBoost=1@100      |WPlatenEtchMain=1
|WClaritasDep=              |WClaritasEtch=     
|%CoilDepLoad=40            |%CoilDepTune=50            |%CoilEtchLoad=40                  |%CoilEtchTune=50
|%PlatenDepLoad=32.5        |%PlatenDepTune=51.9        |%PlatenEtchLoad=32.5              |%PlatenEtchTune=51.9
|%CLaritasLoad=            |%ClaritasTune=              |Temperature='''-19'''
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro | '''1''']]
}}
{{Template:Peg1RecipeTableVerBAddrowColors
|RecipeName=DREM 2kW micro
|PriorProcessSteps=  Pump to base, Clamp Substrate, home platen matching unit, stabilisation
|Keywords=
|PlatenPosition=U          |PlatenFrequency=HF          |StabilisationTime=          |StartCycleEndCycle=D/E
|DepositionTime=1.2        |EtchTime=3                  |NumberOfCycles=
|PressureDepDelay=          |PressureDepBoost=          |PressureDepMain=100%
|PressureEtchDelay=        |PressureEtchBoost=          |PressureEtchMain=100%
|C4F8DepDelay=0.3@5        |C4F8DepBoost= 0.5@50        |C4F8DepMain=200
|C4F8EtchDelay=0.5@100      |C4F8EtchBoost=              |C4F8EtchMain=5
|SF6DepDelay=0.3@200        |SF6DepBoost=0.5@200        |SF6DepMain=15
|SF6EtchDelay=2@15          |SF6EtchBoost=0.3@100        |SF6EtchMain=200
|O2Dep=                    |O2Etch=                    |ArDep=150                        |ArEtch=150
|WCoilDep=2                |WCoilEtch=2                |WPlatenDep=1
|WPlatenEtchDelay=1@1      |WPlatenEtchBoost=1@100      |WPlatenEtchMain=1
|WClaritasDep=              |WClaritasEtch=     
|%CoilDepLoad=40            |%CoilDepTune=50            |%CoilEtchLoad=40                  |%CoilEtchTune=50
|%PlatenDepLoad=32.5        |%PlatenDepTune=51.9        |%PlatenEtchLoad=32.5              |%PlatenEtchTune=51.9
|%CLaritasLoad=            |%ClaritasTune=              |Temperature='''0'''
|Link2RecipeRun=[[Specific Process Knowledge/Etch/DRIE-Pegasus/DREM/DREM 2kW micro at 0 degre | '''1''']]
}}
|}

Revision as of 11:07, 11 May 2021

The DREM processes

DREM 2kW micro

DREM 2kW micro
Recipe General Pressure Gases Generators Matching Tem- pera- ture Results
C4F8 SF6 O2 Ar Coil Platen Coil Platen
Platen Stb S/E Dp Et Cyc Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Runs Keywords
U/D H/L D B M D B M D B M D B M D B M D B M D B M L T L T L T L T
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 1
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 -19
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 1
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 0